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Thin n-in-p planar pixel sensors and active edge sensors for the ATLAS upgrade at HL-LHC

机译:用于aTLas的薄n-in-p平面像素传感器和有源边缘传感器   在HL-LHC升级

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摘要

Silicon pixel modules employing n-in-p planar sensors with an activethickness of 200 $\mu$m, produced at CiS, and 100-200 $\mu$m thin active/slimedge sensor devices, produced at VTT in Finland have been interconnected toATLAS FE-I3 and FE-I4 read-out chips. The thin sensors are designed for highenergy physics collider experiments to ensure radiation hardness at highfluences. Moreover, the active edge technology of the VTT production maximizesthe sensitive region of the assembly, allowing for a reduced overlap of themodules in the pixel layer close to the beam pipe. The CiS production includesalso four chip sensors according to the module geometry planned for the outerlayers of the upgraded ATLAS pixel detector to be operated at the HL-LHC. Themodules have been characterized using radioactive sources in the laboratory andwith high precision measurements at beam tests to investigate the hitefficiency and charge collection properties at different bias voltages andparticle incidence angles. The performance of the different sensor thicknessesand edge designs are compared before and after irradiation up to a fluence of$1.4\times10^{16}n_{eq}/cm^{2}$.
机译:互连了采用n-in-p平面传感器的硅像素模块,该传感器的有源厚度为200μm,由CiS生产,以及100-200μm的有源/细长型传感器设备,由芬兰VTT生产toATLAS FE-I3和FE-I4读出芯片。薄型传感器设计用于高能物理对撞机实验,以确保高通量时的辐射硬度。此外,VTT生产的有源边缘技术使组件的灵敏区域最大化,从而减少了在靠近束管的像素层中的模块的重叠。根据计划的模块几何形状,CiS产品还包括四个芯片传感器,这些传感器是为要在HL-LHC上运行的升级版ATLAS像素检测器的外层计划的。该模块已在实验室中使用放射源进行了表征,并在电子束测试中进行了高精度测量,以研究在不同偏置电压和粒子入射角下的命中效率和电荷收集特性。比较辐照前后不同传感器厚度和边缘设计的性能,直到通量为$ 1.4 \乘以10 ^ {16} n_ {eq} / cm ^ {2} $。

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